Date: August 17, 2020

Time: 2 pm - 6 pm

Place: Room 114, Barry Lam Hall, National Taiwan University

Host: Prof. Chih-Ting Lin (Graduate Institute of Electronics Engineering, National Taiwan University)

Organizer: IEEE ED National Taiwan University Student Chapter

14:00-15:40 SESSION I

Nitrided and Fluorinated Graphene and MoS2 for Transistors, Memristors and Chemical Sensors Applications

Speaker: Prof. Chao-Sung Lai (Dean, College of Engineering, Chang Gung University; IEEE, Electron Device Society, Distinguished Lecturer)

15:40-16:00 Coffee Break

16:00-17:40 SESSION II

Sharing Experiences of Technology and Product Development

Speaker: Dr. Po-Han Chen (Staff engineer, Himax Technologies, Inc.)

17:40-18:00 Q&A